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International Journal of Oral Implantology & Clinical Research
Abstract
 
 

ABSTRACT

Introduction: Placement of endosseous plateau implants represents a valid treatment in the setting of limited alveolar bone height. This study’s objectives were to evaluate the effect of submerging and platform switching on crestal bone loss and redistribution of occlusal forces, the advantage of plateau design in providing more surface area for osseointegration, and the outcome of autogenous bone grafting from the implant osteotomy site as an alternate to exogenous bone graft.

Materials and methods: A prospective study of 10 patients with mandibular posterior edentulism was selected. Preoperative alveolar bone height (mean 11.87 mm) and width (8.22 mm) were measured on cone beam computed tomography. Twostaged implants were placed with 2.0 mm of submergence, which remained below the alveolar crest. The distribution of site according to bone quality and implant dimension was D2. Patients were followed up after 7 days for pain, infection, soft tissue dehiscence, and paresthesia followed by an average period of 1 year and evaluated for bone gain over implant shoulder, crestal bone loss, and peri-implant radiolucency.

Results: One-year postloading survival rates for submerged plateau implants was 100.0% in D2 bone, with no peri-implant radiolucency and statistically insignificant (ç-0.8 mm) crestal bone loss.

Conclusion: Submerged plateau implants have excellent survival rates and crestal bone level maintenance. The results of this study support the hypothesis that plateau implants can be successfully used in mandibular areas with limited bone height.

Keywords: Autogenous bone graft, Crestal bone loss, Plateau, Platform switch, Sloping shoulder, Submerged.

How to cite this article: Shukla DH, Anchlia SM, Patel NP, Nagavadiya V, Panwar RK, Domadiya HL. Submerged Plateau Implants: A Practical Solution for Mandibular Posterior Region. Int J Oral Implantol Clin Res 2017;8(1):5-11.

Source of support: Nil

Conflict of interest: None

 
 

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